Figure 4 shows the transmission spectra of the transparent film measured before and after environmental testing. After the tests were carried out at 55°C and

95% moisture for 6 h (ISO 9211), the transmittance of the TAT multilayers decreased, whereas no attenuation of visible light was observed for the TAS multilayers. This shows that the SiO2 film acted as a very good moisture barrier material, thereby preventing transmittance losses in the system. The transmittance of the TAS film improved with decreasing reflectance, which is related to the high-reflection index of the TiO2 layer. The weathering resistance of the TAS film could be improved by using a protective SiO2 film as the uppermost layer. Figure 3 Transmittance spectra of DMD structures with different metal and dielectric layers. Figure 4 Transmittance values before and after environmental testing. Microstructure of the TAS SCH772984 ic50 multilayers The transmission electron microscopy (TEM) image of the cross ABT-263 price section of a TAS film on a glass substrate presented in Figure 5 confirms that each layer (TiO2, SiO2, and Ag) had a flat and smooth structure,

which suggests high conductivity at the Ag layer of the TAS film. The transparent conductive multilayers (TAS) fabricated by E-beam coating with IAD have lower resistance than those prepared without IAD [2]. This is due to the different morphologies

of the Ag layers. The film prepared click here without IAD exhibits an island structure, and the low contact between the Ag islands results in a higher resistivity. On the other hand, the Ag layer prepared by with IAD is smooth and has a low resistivity. The TAS film reported herein was prepared by E-beam coating with IAD and has a low resistivity (sheet resistivity of 6.5 Ω/sq for a 9.5-nm-thick Ag layer). The Ag layer in this material is flat and sufficiently smooth to make it attractive for use as a transparent film. The film thicknesses determined from the TEM images are consistent with those predicted by simulations carried out using the Macleod software. The 10-nm-thick Ag layer was Cytidine deaminase a continuous strip exhibiting a nanoscale crystalline structure. While the TiO2 films were also polycrystalline, the SiO2 films exhibited an amorphous structure. The EDS mapping images shown in Figure 6 suggest that no oxides are present in the Ag layer, although diffusion is possible. Figure 7 shows EDS line scans that confirm the results of EDS mapping. The formation of partial nanocrystals is also clearly visible. Figure 5 TEM image of the cross section of a TAS film. Figure 6 Cross-sectional STEM mapping of TAS multilayer structures deposited by E-beam evaporation with IAD. Figure 7 EDS line scans of TiO 2 /Ag/SiO 2 multilayer structures deposited by E-beam evaporation with IAD.